- One instrument instead of two: Only MultiView plasma instrument in the market ‒ true axial AND true radial plasma observation in a single instrument
- ORCA Optical System: Simultaneous spectrum capture in the 130-770 nm wavelength range with up to 5x more sensitivity than Echelle based systems – delivers best in class performance in the UV/VUV range
- LDMOS Generator: Up to 2000 W power and robust enough to handle volatile organics and high dissolved solids with ease
The SPECTRO ARCOS ICP-OES excels in industrial and academic applications for the most advanced elemental analysis of metals, chemicals, petrochemicals, and other materials.
The design of the SPECTRO ARCOS ensures exceptionally low operating costs over a long, reliable service life. And it packs a modern, ergonomic chassis with proven features such as no-purge UV-PLUS sealed gas purification technology, no-external-cooling OPI-Air Interface.
For more information, please visit: